The SolaReactorTM offers leading edge technology Plasma Enhanced Chemical Vapor Deposition (PECVD) and liquid source deposition systems designed to optimize throughput and enhance cell efficiency in the production of photovoltaic films

Designed specifically for the solar industry, the SolaReactorTM deposits a superior PECVD AR film and low sheet resistance liquid source deposition to produce highly efficient solar cells. The SolaReactorTM provides increased yields and superior reflective value films, compared with atmospheric TiNitride process. The SolarReactorTM includes a baseline process to produce one of the most efficient AR coatings available. The liquid source configuration controls the sheet resistance to a high degree of accuracy.

  • Compact: floor space required is less than 4.2m² (45.9 ft²). Overall height 2.3m (90")
  • May be configured for left hand or right hand, stand-alone or through-wall installation
  • May be configured to deposit a dual refractive index PECVD ARC film
  • Each tube level microprocessor controlled for functional capability and ease of operation
  • Liquid source and PECVD processes available in the same system frame
  • Accommodates substrates up to 200mm diameter and 156mm psuedo-square
  • Large bore system available accommodates substrates up to 300mm diameter/diagonal
  • Processes either poly-crystalline or mono-crystalline substrates
  • Deposited/un-deposited substrate boats exchanged in <10 seconds
  • Incorporates proven technologies developed over the last 50 years in the semiconductor and solar industries

Complete ARC Film Deposition System Features

  • Liquid source, oxidation & PECVD configuration capability
  • In-line load station
  • Per tube microprocessor processor/temperature controls
  • Low thermal mass heating elements
  • Gas cabinet with plumbing and MFC controlled gas systems
  • Independent s/s scavenger at each tube level (POCl3 configuration)