Quad 300™ Furnace System Major Advantages

Project Description

  • • Ideally suited for both semiconductor and solar applications   •
  • •300mm round wafers/diagonal substrates processing capability   •
  • • May be configured for LPCVD, PECVD and atmospheric processes   •
  • • Accurate paddle/door positioning system •
  • • Full end blocks to minimize heat loss •
  • • Digital controls with HOST computer •
  • • Fully adjustable cantilever loaders   •
  • • Horizontal Laminar Flow available •
  • • Mass flow controlled gas systems   •
  • • Fast response heating elements   •
  • • High thruput, up to 3,000 wph •
  • • 40” (101cm) thermal flat zone   •
  • • Low process tube centerline   •
  • • Insulated quartz tube doors   •