Sirius Semiconductor Diffusion Furnaces
PRO 150: 4-stack furnace system for wafers up to 150mm dia.
PRO 200: 4-stack furnace system for wafers up to 200mm dia.
PRO 300: 3-stack furnace system for wafers up to 300mm dia.
Custom configurations available
- Compact only 4.2 m² (45.9 ft²) in clean room
- Each tube level microprocessor controlled for functional capability and ease of operation
- Windows® based operating system for ease of use
- Host computer with flat screen and keyboard/mouse controls (touch-screen available).
- Available with atmospheric, LPCVD and PECVD processing capability
- Film uniformities on many processes comparable with vertical furnaces at less than 1/3 the cost
SIRIUS Diffusion Furnace Systems are Fully Equipped
Our systems are complete, compact and can be configured to your specific requirements
